Freiburg (Germany) April 12, 2010 - Homogenous, thin layers in sputtering processes with high arc rates - in the past, this was best achieved using expensive pulsed direct current power supplies. Today this can be performed at significantly lower costs. HÜTTINGER is launching a new generation of continuous direct current power supplies that achieve optimum film deposition results, even in the most demanding processes: the TruPlasma DC Series 3000 NEW.

Developed especially for demanding sputtering processes

HÜTTINGER's new development will officially be introduced at the Practical Vacuum trade show, to be held in Birmingham, England, April 27 to 28, 2010. Available with outputs of 20 to 160 kilowatts, these generators deliver reliable, accurate power over a broad impedance range.

"We have developed the TruPlasma DC Series 3000 NEW especially for demanding sputtering processes" explains Wojciech Glazek, Product Manager at HÜTTINGER for application fields of the new power supply. "These generators are best suited for coating processes in solar cell manufacturing or in coating architectural glass, where stability and continuous throughput are essential".

Optimized coating results thanks to innovative arc management

The TruPlasma DC Series 3000 NEW is technically unique to the market because of its innovative arc management. For this power supply, HÜTTINGER considerably improved the arc management system CompensateLine. In an arc event, the new CompensateLine now better compensates the energy stored in the output circuits of the power supply and cables connecting power supply and cathode. Consequently, the TruPlasma DC Series 3000 NEW features very fast response times and minimal residual arc energy. In addition, CompensateLine ensures that the arc energy is not dissipated. Instead, the energy is recirculated to the power supply and into the process. The advantage is two-fold: First, the generator is more energy-efficient than air-cooled power supplies. Second, the generator emits less heat, considerably reducing the risk of overheating.

In brief, when using the TruPlasma DC Series 3000 NEW production can be designed to be more profitable than with comparable power supplies. Even in processes with high arc rates, such as in TCO (Transparent Conductive Oxide) sputtering, these generators allow thin, homogenous layers. Where only pulsed generators could be used in the past, the TruPlasma DC Series 3000 NEW now provides a cost-efficient alternative with optimum results.

Water-cooling allows compact and rugged design

Another advantage of the TruPlasma DC Series 3000 NEW is its complete water-cooling, which makes for a very compact generator that can be easily integrated into existing coating lines. The power supply's broad range of communication interfaces is another helpful feature. Moreover the water-cooling enhances the generator's ruggedness. Also, dust and contamination cannot enter and an additional filter is not required. Regardlesse of high heat or dusty environments - the power supply is largely independent of its ambient conditions and is reliable and stable even in a rugged production environment.

Technical features that will allow control of almost any process

Despite its compact size, the power density of the TruPlasma DC Series 3000 NEW is high. Particularly noteworthy is the high output voltage of 1000 volts. Thus, the power supply is suited for a broad range of applications.

What makes the TruPlasma DC Series 3000 NEW attractive for plant engineering and construction is that it can be operated with an input voltage within a range of 400 to 480 volts. Therefore, the same generator can be used equally well in Europe or in the USA.

"The TruPlasma DC Series 3000 NEW sets new standards in the area of direct current sputtering," summarizes Wojciech Glazek about the advantages of the power supply. "Thanks to its improved arc management, the generator handles even difficult processes withouth problems. It is compact, universal and more efficient than competitors' products. This will allow more cost-efficient production at higher yields and provides a clear competitive advantage to the user."