- PFM Matchboxes ensure the optimal power transfer from the generator into the plasma discharge.
- They are designed and optimized with practice in mind.
- Their operation is stable and reliable.
- A µ-controller ensures function in all phases of the plasma process.
- Its precise capture of measured values permits the uptake or stabilization of plasma paramters.
PFM Matchboxes
The professional processors for the appropriate impedance
Matchboxes are used for optimal power transfer from a RF generator in a plasma process. Their function is to transform the changing, complex and non-linear plasma impedance to the standardized outgoing impedance of the RF generator and keep it constant.
The Matchboxes also support the ignition phase of a plasma discharge.
HÜTTINGER offers standardized solutions for a number of plasma processes.
- RF etching
- CVD, PECVD processes
- PVD processes (sputtering)
- Inductively coupled plasmas (ICP)
All the networks have standard measuring technology for capture of process data.
- DC-Bias measurement
- RF voltage measurement
- RF current measurement (optional)
Control of the Matchboxes is done with a HÜTTINGER generator via the generator's control unit or data interface. A separate PFC 300RF control unit is available.