Versatile generators for your sputtering tasks. All units feature two operation modes: a high voltage mode at 1200 V for substrate etching processes and a low voltage mode at 300 V for biased film deposition processes:
| Features | Benefits | |
|---|---|---|
| Special power and control design, focused on emphasizing voltage stability | Ensuring consistent process conditions | |
| High voltage and low voltage modes in one box | Reduces system complexity, covers two processes with one device | |
| Lowest arc energy available on the market | Runs processes smoothly for optimum film quality results | |
| Output cable inductance compensation | Neutralizes the cable's residual energy for fast recovery after arcs | |
| Rear connection with various communication interfaces | Optimum tool integration | |
Our TruPlasma Bias Series 3000 family is a versatile set of state-of-the-art DC bias generators. Two operation modes, either at low voltage of up to 300 V or at high voltage of up to 1200 V, support different applications providing an optimum process environment. The modes are suited to assist in optical and metal coating processes as well as in pre-treatment and etching applications, for use e.g. in the semiconductor and hard coating manufacturing. However, TruPlasma Bias Series 3000 can also be used for any application with similar voltage and current requirements.
