TruPlasma Bias Series 4000 optimizes pulsed DC plasma processes.
All units feature two operation modes: a high voltage mode at 1200 V for substrate etching processes, and a low voltage mode at 300 V for biased film deposition processes:
| Features | Benefits | |
|---|---|---|
| Special power and control design, focused on emphasizing voltage stability | Ensuring consistent process conditions | |
| High voltage and low voltage modes in one box | Reduces system complexity, covers two processes with one device | |
| Lowest arc energy available on the market | Runs processes smoothly for optimum film quality results | |
| Output cable inductance compensation | Neutralizes the cable's residual energy for fast recovery after arcs | |
| Rear connection with various communication interfaces | Optimum tool integration | |
The TruPlasma Bias Series 4000 family is a versatile set of state-of-the-art pulsed DC bias generators. Pulse frequency up to 100 kHz as well as continuous bias output is possible.
Two operation modes support different applications, thereby providing an optimum process environment: a high voltage mode up to 1200 volts and a low voltage mode up to 300 volts. These modes are suited to assist in optical and metal coating processes as well as in pre-treatment and etching applications, for use e.g. in semiconductor and hard coating manufacturing. However, TruPlasma Bias Series 4000 can also be used for any application with similar voltage and current requirements.
