Generate high density plasmas for superior deposition results with our power supplies for High Power Impulse Magnetron Sputtering (HIPIMS):
| Features | Benefits | |
|---|---|---|
| High peak power of up to 8 megawatts | Unsurpassed flexibility from small-scale and large-scale industrial processes | |
| Active arc suppression | Droplet-free sputtering, minimum film defects | |
| Adjustable pulse duration and frequency | Easily adaptable to existing cathodes and process requirements | |
| Real-time, pulse-by-pulse monitoring and control | Effective utilization of cathode | |
| Rear connection version with various control interfaces available | Optimum tool integration | |
The TruPlasma Highpulse Series 4000 product family of DC power supplies is the ideal choice for HIPIMS processes. HIPIMS represents the most recent development of PVD pulsed sputtering technology utilizing extremely dense plasmas.
High peak power of up to 8 megawatts generates a highly ionized plasma and enables high ion fluxes. As a result, very coherent and dense films without any droplets can be realised. When in combination with biased substrate configurations, TruPlasma Highpulse 4000 power supplies also provide superior results in etching, pre-treatment and trench-filling applications.
